发明公开
EP4406014A1 SEMICONDUCTOR DIE WITH INTERCONNECT BUMP DESIGN EMPLOYING REPURPOSED SEED LAYER FOR FORMING ADDITIONAL SIGNAL PATHS TO BACK END-OF-LINE (BEOL) STRUCTURE, AND RELATED INTEGRATED CIRCUIT (IC) PACKAGE AND FABRICATION METHOD
审中-实审
![SEMICONDUCTOR DIE WITH INTERCONNECT BUMP DESIGN EMPLOYING REPURPOSED SEED LAYER FOR FORMING ADDITIONAL SIGNAL PATHS TO BACK END-OF-LINE (BEOL) STRUCTURE, AND RELATED INTEGRATED CIRCUIT (IC) PACKAGE AND FABRICATION METHOD](/ep/2024/07/31/EP4406014A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: SEMICONDUCTOR DIE WITH INTERCONNECT BUMP DESIGN EMPLOYING REPURPOSED SEED LAYER FOR FORMING ADDITIONAL SIGNAL PATHS TO BACK END-OF-LINE (BEOL) STRUCTURE, AND RELATED INTEGRATED CIRCUIT (IC) PACKAGE AND FABRICATION METHOD
- 申请号:EP22777129.2 申请日:2022-08-23
- 公开(公告)号:EP4406014A1 公开(公告)日:2024-07-31
- 发明人: LI, Yue , LISK, Durodami , SUN, Jinying
- 申请人: QUALCOMM INCORPORATED
- 申请人地址: US San Diego, California 92121-1714 ATTN: International IP Administration 5775 Morehouse Drive
- 专利权人: QUALCOMM INCORPORATED
- 当前专利权人: QUALCOMM INCORPORATED
- 当前专利权人地址: US San Diego, California 92121-1714 ATTN: International IP Administration 5775 Morehouse Drive
- 代理机构: Pritzlaff, Stefanie Lydia
- 优先权: US 2117483325 2021.09.23
- 国际申请: US2022075315 2022.08.23
- 国际公布: WO2023049578 2023.03.30
- 主分类号: H01L23/485
- IPC分类号: H01L23/485 ; H01L21/60 ; H01L25/065
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L23/00 | 半导体或其他固态器件的零部件 |
--------H01L23/34 | .冷却装置;加热装置;通风装置或温度补偿装置 |
----------H01L23/482 | ..由不可拆卸地施加到半导体本体上的内引线组成的 |
------------H01L23/485 | ...包括导电层和绝缘层组成的层状结构,例如平面型触头 |