发明公开
EP4186708A1 ON-MACHINE-DEVELOPING-TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD
审中-实审
基本信息:
- 专利标题： ON-MACHINE-DEVELOPING-TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD
- 申请号：EP21846380.0 申请日：2021-07-15
- 公开(公告)号：EP4186708A1 公开(公告)日：2023-05-31
- 发明人： NAMBA, Yusuke , ENOMOTO, Kazuaki , KOYAMA, Ichiro , SAKAGUCHI, Akira , YAMAMOTO, Akira
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo 106-8620 26-30, Nishiazabu 2-chome Minato-ku
- 代理机构： HGF
- 优先权： JP2021061163 20210331
- 国际公布： WO2022019217 20220127
- 主分类号： B41N1/14
- IPC分类号： B41N1/14 ; B41C1/10 ; B41M1/06 ; B41N1/08 ; B41N3/03 ; G03F7/00 ; G03F7/004 ; G03F7/027 ; G03F7/028 ; G03F7/029 ; G03F7/09 ; G03F7/11
摘要：
Provided is an on-press development type lithographic printing plate precursor having two or more maximal absorption wavelengths in a wavelength range of 760 nm to 900 nm, in which in a case where the on-press development type lithographic printing plate precursor is subjected to exposure to infrared having a wavelength of 830 nm at an energy density of 110 mJ/cm 2 , in a portion subjected to the exposure, a brightness change ΔL before the exposure and after storage subsequent to the exposure for 24 hours under conditions of 25°C and 70% RH is 3.0 or more. Also provided are a method of preparing a lithographic printing plate and a lithographic printing method in which the on-press development type lithographic printing plate precursor is used.
IPC结构图谱:
| B | 作业；运输 |
| --B41 | 印刷；排版机；打字机；模印机 |
| ----B41N | 印版或箔；印刷机上印刷、着墨、润湿用的表面材料；上述所用表面的制备和保存 |
| ------B41N1/00 | 印版或箔；及其所用材料 |
| --------B41N1/04 | .金属的 |
| ----------B41N1/14 | ..平版印刷箔 |