基本信息:
- 专利标题： METHOD AND APPARATUS FOR AUTOMATIC EXPOSURE
- 申请号：EP22199305.8 申请日：2022-09-30
- 公开(公告)号：EP4161087A2 公开(公告)日：2023-04-05
- 发明人： Godaliyadda, Gunawath Dilshan , Mangla, Mayank , Hua, Gang
- 申请人： Texas Instruments Inc.
- 申请人地址： US Dallas, TX 75265 P.O. Box 655474 Mail Station 3999
- 代理机构： Zeller, Andreas
- 优先权： US202117491382 20210930
- 主分类号： H04N23/73
- IPC分类号： H04N23/73 ; H04N23/76
摘要：
A method for automatic exposure (AE) control is provided that includes receiving statistics for AE control for an image from an image signal processor (ISP) coupled to an image sensor generating the image, computing an exposure value at a current time t (EV(t)) using a cost function based on target characteristics of an image, wherein computation of the cost function uses the statistics, and computing AE settings for the image sensor based on EV(t).
公开/授权文献:
- EP4161087A3 METHOD AND APPARATUS FOR AUTOMATIC EXPOSURE 公开/授权日：2023-06-28