发明公开
EP3313151A1 METHOD FOR MANUFACTURING ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR FORMING ELECTRON HOLE INJECTION LAYER
审中-公开
![METHOD FOR MANUFACTURING ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR FORMING ELECTRON HOLE INJECTION LAYER](/ep/2018/04/25/EP3313151A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: METHOD FOR MANUFACTURING ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR FORMING ELECTRON HOLE INJECTION LAYER
- 专利标题(中):制造有机电子元件的方法以及形成电子穴注入层的方法
- 申请号:EP16814366.7 申请日:2016-06-21
- 公开(公告)号:EP3313151A1 公开(公告)日:2018-04-25
- 发明人: SASSA, Shuichi , MORISHIMA, Shinichi , ROKUHARA, Kouichi
- 申请人: Sumitomo Chemical Company Limited
- 申请人地址: 27-1 Shinkawa 2-chome Chuo-ku Tokyo 104-8260 JP
- 专利权人: Sumitomo Chemical Company Limited
- 当前专利权人: Sumitomo Chemical Company Limited
- 当前专利权人地址: 27-1 Shinkawa 2-chome Chuo-ku Tokyo 104-8260 JP
- 代理机构: J A Kemp
- 优先权: JP2015125059 20150622
- 国际公布: WO2016208596 20161229
- 主分类号: H05B33/10
- IPC分类号: H05B33/10 ; H01L21/336 ; H01L29/786 ; H01L51/44 ; H01L51/46 ; H01L51/48 ; H01L51/50 ; H05B33/02
摘要:
A method for manufacturing an organic electronic element according to one embodiment includes: a hole injection layer coating film formation step of applying a hole injection layer coating liquid containing a material having an electron-accepting property on a plastic substrate 10 to form a hole injection layer coating film 22b; and a heat treatment step of heating the hole injection layer coating film by irradiating the hole injection layer coating film with an infrared ray to form a hole injection layer. The hole injection layer coating film has absorption in a first wavelength range of 1.2 µm to 5.0 µm, and the infrared ray is an infrared ray in which 80% or more of total radiation energy of the infrared ray in a wavelength range of 1.2 µm to 10.0 µm is included in the first wavelength range.
摘要(中):
根据一个实施方式的用于制造有机电子元件的方法包括:空穴注入层涂膜形成步骤,其将包含具有电子接受性的材料的空穴注入层涂布液施加到塑料基板10上以形成空穴注入层 涂膜22b; 以及通过用红外线照射空穴注入层涂膜来加热空穴注入层涂膜以形成空穴注入层的热处理步骤。 空穴注入层涂膜在1.2μm至5.0μm的第一波长范围内具有吸收,并且红外线是这样的红外线,其中红外线的总辐射能的80%或更多的波长范围为1.2μm至 第一波长范围包括10.0微米。
IPC结构图谱:
H | 电学 |
--H05 | 其他类目不包含的电技术 |
----H05B | 电热;其他类目不包含的电照明 |
------H05B33/00 | 电致发光光源 |
--------H05B33/10 | .专门适用于制造电致发光光源的设备或方法 |