基本信息:
- 专利标题： A MULTI-AXIS MAGNETIC LENS
- 专利标题（中）：多轴磁性镜头
- 申请号：EP17168514.2 申请日：2010-01-22
- 公开(公告)号：EP3244419A3 公开(公告)日：2018-01-17
- 发明人： CHEN, Zhong-Wei , REN, Wei-Ming , Kanai, Kenichi , Liu, Xue-Dong
- 申请人： Hermes Microvision Inc.
- 申请人地址： 7F No. 18 Puding Rd. East Dist., Hsinchu City 300 TW
- 专利权人： Hermes Microvision Inc.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： ASML NETHERLANDS B.V.
- 代理机构： Karakatsanis, Georgios
- 优先权： US636007 20091211
- 主分类号： G21K1/08
- IPC分类号： G21K1/08 ; H01J37/141
摘要：
The present invention relates to a multi-axis magnetic lens for a charged particle beam system, comprising a pair of parallel magnetic conductor plates 40,41 having each a plurality holes, the holes in one plate being aligned with the holes in the other plate, and each hole comprising a magnetic insert ring 310-1,310-2. The hole pairs with their magnetic insert rings form a plurality of sub-lens modules. A common excitation coil provides magnetic flux to the plurality of sub-lens modules.
A gap is formed between the outer sidewall of each magnetic insert ring 310-1,310-2 and the inner sidewall of each hole.
The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.
摘要（中）：
A gap is formed between the outer sidewall of each magnetic insert ring 310-1,310-2 and the inner sidewall of each hole.
The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.
用于带电粒子束系统的多轴磁透镜技术领域本发明涉及一种用于带电粒子束系统的多轴磁透镜，其包括一对平行的导磁板40,41，每个导磁板具有多个孔，一个板中的孔与另一个板中的孔对齐， 并且每个孔包括磁性插入环310-1,310-2。 孔对与其磁性插入环形成多个子透镜模块。 共同的励磁线圈向多个子透镜模块提供磁通量。 在每个磁性插入环310-1,310-2的外侧壁与每个孔的内侧壁之间形成间隙。 该设备消除了由共同激励线圈产生的磁场中的不期望的非轴对称横向磁场分量，并且留下期望的轴对称场用于聚焦系统内采用的每个粒子束。
公开/授权文献:
- EP3244419B1 A MULTI-AXIS MAGNETIC LENS 公开/授权日：2023-05-31
IPC结构图谱:
| G | 物理 |
| --G21 | 核物理；核工程 |
| ----G21K | 未列入其他类目的粒子或电磁辐射的处理技术；照射装置；γ射线或X射线显微镜 |
| ------G21K1/00 | 辐射或粒子的处理装置，如聚焦、慢化 |
| --------G21K1/08 | .用电或磁装置使束流偏转、集中或聚焦 |