基本信息:
- 专利标题： SUBSTRATE HANDLING SYSTEM AND LITHOGRAPHIC APPARATUS
- 申请号：EP15707146.5 申请日：2015-03-02
- 公开(公告)号：EP3117270B1 公开(公告)日：2018-07-18
- 发明人： LOF, Joeri , KAUFFMAN, Joost , PETERS, Martin Dieter Nico , RUTGERS, Petrus Theodorus , STOPEL, Martijn Hendrikus Wilhelmus , VAN DEN EIJKEL, Gerard , VAN DER SCHOOT, Harmen Klaas , VISSER, Raimond
- 申请人： ASML Netherlands B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： Ras, Michael Adrianus Josephus
- 优先权： EP14159143 20140312
- 国际公布： WO2015135782 20150917
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00
摘要：
A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.