![Plasma source and surface treatment method](/ep/2015/12/30/EP2960358A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Plasma source and surface treatment method
- 专利标题(中):Plasmaquelle und Verfahren zurOberflächenbehandlung
- 申请号:EP14173878.1 申请日:2014-06-25
- 公开(公告)号:EP2960358A1 公开(公告)日:2015-12-30
- 发明人: CREYGHTON, Yves Lodewijk Maria , POODT, Paulus Willibrordus George , SIMOR, Marcel , ROOZEBOOM, Freddy
- 申请人: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
- 申请人地址: Anna van Buerenplein 1 2595 DA 's-Gravenhage NL
- 专利权人: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
- 当前专利权人: Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO
- 当前专利权人地址: Anna van Buerenplein 1 2595 DA 's-Gravenhage NL
- 代理机构: V.O.
- 主分类号: C23C16/455
- IPC分类号: C23C16/455 ; C23C16/513 ; H01J37/32 ; H05H1/24 ; H01L21/314
摘要:
A plasma source has an outer surface (12), interrupted by an aperture (14) for delivering an atmospheric plasma from the outer surface. A transport mechanism (11) transports a substrate (10) in parallel with the outer surface, closely to the outer surface, so that gas from the atmospheric plasma may form a gas bearing between the outer surface and the substrate. A first electrode (16a,b) of the plasma source has a first and second surface extending from an edge of the first electrode that runs along the aperture. The first surface defines the outer surface on a first side of the aperture. The distance between the first and second surface increase with distance from the edge. A second electrode (17) covered at least partly by a dielectric layer (18) is provided with the dielectric layer facing the second surface of the first electrode, substantially in parallel with the second surface of the first electrode, leaving a plasma initiation space on said first side of the aperture, between the surface of the dielectric layer and the second surface of the first electrode. A gas inlet (19a,b) is in communication with the plasma initiation space to provide a gas flow from the gas inlet to the aperture through the plasma initiation space. Atmospheric plasma initiated in the plasma initiation space flows to the aperture, from which it leaves to react with the surface of the substrate.
摘要(中):
等离子体源具有由用于从外表面输送大气等离子体的孔(14)中断的外表面(12)。 输送机构(11)将与外表面平行的基板(10)紧密地输送到外表面,使得来自大气等离子体的气体可以在外表面和基板之间形成气体轴承。 等离子体源的第一电极(16a,b)具有从沿着孔径延伸的第一电极的边缘延伸的第一和第二表面。 第一表面限定孔的第一侧上的外表面。 第一和第二表面之间的距离随着与边缘的距离而增加。 至少部分地由电介质层(18)覆盖的第二电极(17)设置有电介质层,其面对第一电极的第二表面,基本上与第一电极的第二表面平行,留下等离子体引发空间 所述孔的所述第一侧在介电层的表面和第一电极的第二表面之间。 气体入口(19a,b)与等离子体引发空间连通,以提供通过等离子体引发空间从气体入口到孔的气流。 在等离子体起始空间中引发的大气等离子体流入孔,离开该孔与基板的表面反应。