![Surface position detection apparatus, exposure apparatus and exposure method](/ep/2015/04/29/EP2520978B1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Surface position detection apparatus, exposure apparatus and exposure method
- 专利标题(中):表面位置检测装置,曝光装置和曝光方法
- 申请号:EP12150436.9 申请日:2006-06-28
- 公开(公告)号:EP2520978B1 公开(公告)日:2015-04-29
- 发明人: Hidaka, Yasuhiro , Nagayama, Tadashi
- 申请人: Nikon Corporation
- 申请人地址: 12-1, Yurakucho 1-chome Chiyoda-ku Tokyo 100-8331 JP
- 专利权人: Nikon Corporation
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: NIKON CORPORATION
- 代理机构: Hoffmann Eitle
- 优先权: JP2005200178 20050708
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G01B11/00
摘要:
A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member (7) having first reflective surfaces (7b, 7c), and a light receiving system has a light receiving prism member (8) having second reflective surfaces (8b, 8c) arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.