![METHOD FOR PRODUCING HIGH PURITY SILICON](/ep/2012/08/01/EP2480497A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: METHOD FOR PRODUCING HIGH PURITY SILICON
- 专利标题(中):工艺生产高纯度硅
- 申请号:EP10819087.7 申请日:2010-09-09
- 公开(公告)号:EP2480497A1 公开(公告)日:2012-08-01
- 发明人: ZEAITER, Khalil
- 申请人: Elkem Solar AS
- 申请人地址: Hoffsveien 65B 0377 Oslo NO
- 专利权人: Elkem Solar AS
- 当前专利权人: REC SOLAR NORWAY AS, KRISTIANSAND, NO
- 当前专利权人地址: REC SOLAR NORWAY AS, KRISTIANSAND, NO
- 代理机构: Copsey, Timothy Graham
- 优先权: NO20093054 20090923
- 国际公布: WO2011037473 20110331
- 主分类号: C01B33/037
- IPC分类号: C01B33/037 ; C01B33/02 ; C30B29/06
摘要:
The present invention relates to a method for producing high purity silicon comprising providing molten silicon containing 1-10% by weight of calcium, casting the molten silicon, crushing the silicon and subjecting the crushed silicon to a first leaching step in an aqueous solution of HCI and/or HCI + FeCI3 and to a second leaching step in an aqueous solution of HF and HNO3. The leached silicon particles is thereafter subjected to heat treatment at a temperature of between 1250°C and 14200C for a period of at least 20 minutes and the heat treated silicon is subjected to a third leaching step in an aqueous solution of HF and HNO3.
公开/授权文献:
- EP2480497B1 METHOD FOR PRODUCING HIGH PURITY SILICON 公开/授权日:2017-03-15