
基本信息:
- 专利标题: Apparatus and system for arc elmination and method of assembly
- 专利标题(中):Vorrichtung und System zurLichtbogenunterdrückungund Montageverfahren
- 申请号:EP11181040.4 申请日:2011-09-13
- 公开(公告)号:EP2432087A3 公开(公告)日:2014-02-26
- 发明人: Cutler, Seth Adam , Robarge, Dean Arthur , Roscoe, George William
- 申请人: General Electric Company
- 申请人地址: 1 River Road Schenectady, NY 12345 US
- 专利权人: General Electric Company
- 当前专利权人: ABB S.P.A., IT
- 当前专利权人地址: ABB S.P.A., IT
- 代理机构: Illingworth-Law, William Illingworth
- 优先权: US883329 20100916
- 主分类号: H01T2/02
- IPC分类号: H01T2/02 ; H02H9/06 ; H01H1/44
摘要:
An ablative plasma gun (100) includes a first portion (106) having a first diameter (110) and a second portion (1008) having a second diameter (112) that is larger than the first diameter (110), wherein a chamber (104) is defined by the first portion (106) and the second portion (108).
摘要(中):
烧蚀等离子体枪(100)包括具有第一直径(110)的第一部分(106)和具有大于第一直径(110)的第二直径(112)的第二部分(1008),其中, 104)由第一部分(106)和第二部分(108)限定。
公开/授权文献:
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01T | 火花隙;应用火花隙的过压避雷器;火花塞;电晕装置;产生被引入非密闭气体的离子 |
------H01T2/00 | 包括辅助触发装置的火花隙 |
--------H01T2/02 | .包括1个触发电极或1个辅助火花隙的 |