基本信息:
- 专利标题： GAS MANAGEMENT SYSTEM FOR A LASER-PRODUCED-PLASMA EUV LIGHT SOURCE
- 专利标题（中）：基于等离子体LASERERZEUGTEM气体处理系统用于EUV光源
- 申请号：EP08795347 申请日：2008-08-15
- 公开(公告)号：EP2181448A4 公开(公告)日：2012-02-08
- 发明人： BYKANOV ALEXANDER N , ERSHOV ALEXANDER I , FOMENKOV IGOR V , BRANDT DAVID C
- 申请人： CYMER INC
- 专利权人： CYMER INC
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： ASML NETHERLANDS B.V.
- 优先权： US89764407 2007-08-31
- 主分类号： G21G4/00
- IPC分类号： G21G4/00
摘要：
Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.