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专利标题:
ORGANOSILANE POLYMERS, HARDMASK COMPOSITIONS INCLUDING THE SAME AND METHODS OF PRODUCING SEMICONDUCTOR DEVICES USING ORGANOSILANE HARDMASK COMPOSITIONS
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- 专利标题(中):ORGANOSILANPOLYMERE,含硅的硬掩模组合物及其制造方法半导体器件使用有机硅烷HART MASK组合物
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申请号:EP07700795.3
申请日:2007-01-15
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公开(公告)号:EP2004726A1
公开(公告)日:2008-12-24
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发明人:
YOON, Hui Chan
, KIM, Sang Kyun
, LIM, Sang Hak
, UH, Dong Sun
, KIM, Jong Seob
, LEE, Jin Kuk
, OH, Chang Il
, KIM, Min Soo
, YOON, Kyong Ho
, NAM, Irina
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申请人:
Cheil Industries Inc.
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申请人地址:
290 Gongdan 2-dong Gumi-si
Gyeongsangbuk-do 730-710
KR
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专利权人:
Cheil Industries Inc.
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当前专利权人:
Cheil Industries Inc.
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当前专利权人地址:
290 Gongdan 2-dong Gumi-si
Gyeongsangbuk-do 730-710
KR
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代理机构:
Bublak, Wolfgang
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优先权:
KR20060022947 20060313; KR20060025922 20060322; KR20060026194 20060322; KR20060026204 20060322
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国际公布:
WO2007105859 20070920
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主分类号:
C08G77/00
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IPC分类号:
C08G77/00
; C08G77/02
; C08G77/08
; C08G77/06
摘要:
Provided herein, according to some embodiments of the invention, are organosilane polymers prepared by reacting organosilane compounds including (a) at least one compound of Formula I Si(OR 1 )(OR 2 )(OR 3 )R 4 (I) wherein R 1 , R 2 and R 3 may each independently be an alkyl group, and R 4 may be -(CH 2 ) n R 5 , wherein R 5 may be an aryl or a substituted aryl, and n may be 0 or a positive integer; and (b) at least one compound of Formula II Si(OR 6 )(OR 7 )(OR 8 )R 9 (II) wherein R 6 , R 7 and R 8 may each independently an alkyl group or an aryl group; and R 9 may be an alkyl group. Also provided are hardmask compositions including an organosilane compound according to an embodiment of the invention, or a hydrolysis product thereof. Methods of producing semiconductor devices using a hardmask compostion according to an embodiment of the invention, and semiconductor devices produced therefrom, are also provided.