EP1712367B1 PHASE-CHANGE INFORMATION RECORDING MEDIUM, PROCESS FOR PRODUCING THE SAME AND SPUTTERING TARGET.
有权
基本信息:
- 专利标题： PHASE-CHANGE INFORMATION RECORDING MEDIUM, PROCESS FOR PRODUCING THE SAME AND SPUTTERING TARGET.
- 专利标题（中）：相位变化信息记录介质的制造方法及溅射靶材。
- 申请号：EP04771189.0 申请日：2004-08-04
- 公开(公告)号：EP1712367B1 公开(公告)日：2011-03-09
- 发明人： OHKURA, Hiroko , ITO, Kazunori , DEGUCHI, Hiroshi , KATO, Masaki , ABE, Mikiko, Kawasakidaishi Park Familia 403 , SEKIGUCHI, Hiroyoshi , HARIGAYA, Makoto , SHINKAI, Masaru
- 申请人： Ricoh Company, Ltd.
- 申请人地址： 3-6, Nakamagome 1-chome Ohta-ku Tokyo 143-8555 JP
- 专利权人： Ricoh Company, Ltd.
- 当前专利权人： Ricoh Company, Ltd.
- 当前专利权人地址： 3-6, Nakamagome 1-chome Ohta-ku Tokyo 143-8555 JP
- 代理机构： Barz, Peter
- 优先权： JP2004029923 20040205
- 国际公布： WO2005075212 20050818
- 主分类号： B41M5/26
- IPC分类号： B41M5/26 ; G11B7/24 ; G11B7/26 ; C23C14/34
摘要：
A phase-change information recording medium such that overwrite recording is possible, the storage reliability is excellent, initial crystallization is facilitated, the capacity is equivalent to that of DVD-ROMs, the recording sensitivity is good at high linear velocities above the ten-fold recording speed. The phase-change information recording medium comprises a substrate, and over this substrate a first protective layer, a phase-change recording layer, a second protective layer and a reflective layer formed in this order or reverse order. The phase-change recording layer has a composition expressed by SnαSbβGaϜGeδTeϵ-Xζ (where X is at least one element selected from Ag, Zn, In and Cu, α, β, Ϝ ,δ, ϵ and ζ represent the compositional ratios (atomic%) of the respective elements and satisfy the following relations: 5≤α≤25, 40≤β≤91, 2≤Ϝ≤20, 2≤δ≤20, 0≤ϵ≤10, 0≤ζ≤10, and α+β+Ϝ+δ+ϵ+ζ=100).
公开/授权文献:
IPC结构图谱:
| B | 作业；运输 |
| --B41 | 印刷；排版机；打字机；模印机 |
| ----B41M | 印刷、复制、标记或拷贝工艺；彩色印刷 |
| ------B41M5/00 | 复制或标记方法；供其使用的单张材料 |
| --------B41M5/26 | .热压凸印法 |