发明公开
EP1674930A3 Stitching prevention in multibeam imaging for exposing printing plates
失效 - 权利终止
转让
![Stitching prevention in multibeam imaging for exposing printing plates](/ep/2009/08/05/EP1674930A3/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: Stitching prevention in multibeam imaging for exposing printing plates
- 专利标题(中):在多光束曝光法的印版成像无缝
- 申请号:EP05027151.9 申请日:2005-12-13
- 公开(公告)号:EP1674930A3 公开(公告)日:2009-08-05
- 发明人: Klein, Thomas , Sievers, Wolfgang
- 申请人: Esko-Graphics A/S
- 申请人地址: Industriparken 35-37 2750 Ballerup DK
- 专利权人: Esko-Graphics A/S
- 当前专利权人: ESKO-GRAPHICS IMAGING GMBH
- 当前专利权人地址: ESKO-GRAPHICS IMAGING GMBH
- 代理机构: Bird, Ariane
- 优先权: US635809P 20041213; US22576 20041222
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A method of exposing imaging data (542) onto a sensitized medium (550) including exposing K sets (380, 480) of N of tracks (1, 2, 3, 4) onto the medium according to a corresponding part of imaging data, each successive set being a pixel distance apart in a fast scan direction (301, 401). The method further includes exposing L sets (390, 490) of N tracks onto the medium with an offset of M pixels in a slow scan direction (302, 402) substantially perpendicular to the fast scan direction, according to a second corresponding part of imaging data. The method includes repeating alternately exposing K sets and L sets of N tracks until the complete medium is exposed along the fast scan direction. During or after the alternately exposing K sets and L sets, there is progression in the slow scan direction such that after exposing the complete length of N tracks of exposed pixels, the next N tracks match along the medium at the start of the next N tracks.