发明公开
EP1547801A3 Aluminum support for lithographic printing plate and base plate for lithographic printing plate
有权
基本信息:
- 专利标题： Aluminum support for lithographic printing plate and base plate for lithographic printing plate
- 专利标题（中）：用于Flack的印刷版和基板用于印版Flack的铝支座
- 申请号：EP04258097.7 申请日：2004-12-23
- 公开(公告)号：EP1547801A3 公开(公告)日：2006-02-15
- 发明人： Ozaki, Jun Okamoto Chemical Industry Co., Ltd. , Uozumi, Yasuhiro Okamoto Chemical Ind. Co., Ltd.
- 申请人： Okamoto Chemical Industry Co., Ltd
- 申请人地址： 6-4, Chuo 2-chome Warabi-shi, Saitama-ken JP
- 专利权人： Okamoto Chemical Industry Co., Ltd
- 当前专利权人： Okamoto Chemical Industry Co., Ltd
- 当前专利权人地址： 6-4, Chuo 2-chome Warabi-shi, Saitama-ken JP
- 代理机构： Tanner, James Percival
- 优先权： JP2003433648 20031226; JP2004341331 20041126
- 主分类号： C25D11/24
- IPC分类号： C25D11/24 ; B41N3/03
摘要：
An aim of the present invention is to provide a support for lithographic printing plates provided with a photosensitive layer containing an acid generator and an acid-decomposable compound, that offers superior sensitivity, chemical resistance, print durability, and little scumming during printing. The present invention provides an aluminum support for a lithographic printing plate, the support being obtainable by treating a surface of an anodized aluminum plate with a treatment liquid comprising metal fluoride, metal phosphate salt, and perchlorate, and a base plate for a lithographic printing plate using the same.
公开/授权文献:
IPC结构图谱:
| C | 化学；冶金 |
| --C25 | 电解或电泳工艺；其所用设备 |
| ----C25D | 覆层的电解或电泳生产工艺方法；电铸；工件的电解法接合；所用的装置 |
| ------C25D11/00 | 表面反应，即形成转化层的电解覆层 |
| --------C25D11/02 | .阳极氧化 |
| ----------C25D11/04 | ..铝或以其为基之合金的 |
| ------------C25D11/18 | ...后处理，例如封孔处理 |
| --------------C25D11/24 | ....化学法后处理 |