基本信息:
- 专利标题： LASER SPECTRAL ENGINEERING FOR LITHOGRAPHIC PROCESS
- 专利标题（中）：激光光谱工程的光刻工艺
- 申请号：EP02752300.0 申请日：2002-07-11
- 公开(公告)号：EP1412182A2 公开(公告)日：2004-04-28
- 发明人： SPANGLER, Ronald, L. , LIPCON, Jacob, P. , RULE, John, A. , JACQUES, Robert, N. , KROYAN, Armen , LALOVIC, Ivan , FOMENKOV, Igor, V. , ALGOTS, John, M.
- 申请人： Cymer, Inc.
- 申请人地址： 17075 Thornmint Court San Diego, CA 92127 US
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： 17075 Thornmint Court San Diego, CA 92127 US
- 代理机构： Grünecker, August, Dipl.-Ing.
- 优先权： US918773 20010727; US36925 20011221
- 国际公布： WO2003011595 20030213
- 主分类号： B41C1/00
- IPC分类号： B41C1/00
摘要：
An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.
摘要（中）：
一种集成电路光刻技术被称为（用于放电激光器的带宽控制的光谱工程）计算机模拟光刻参数以确定产生期望光刻结果所需的期望激光光谱快速响应调谐机构（104）调节中心波长 激光脉冲以脉冲突发的形式获得用于接近期望的激光光谱的脉冲突发的集成光谱。控制激光光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在照片中产生改善的图案分辨率 提供线变窄设备（106），其具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统;波长调谐镜以大于每分钟500次的抖动 与激光的重复频率同相。
IPC结构图谱:
| B | 作业；运输 |
| --B41 | 印刷；排版机；打字机；模印机 |
| ----B41C | 印刷版的制造或复制工艺 |
| ------B41C1/00 | 印版准备 |