
基本信息:
- 专利标题: PRODUCTION AND USE OF TETRAFLUOROSILANE
- 专利标题(中):制造四氟
- 申请号:EP02745980.9 申请日:2002-07-11
- 公开(公告)号:EP1406837A1 公开(公告)日:2004-04-14
- 发明人: ATOBE, Hitoshi,c/o SHOWA DENKO K.K. , OKA, Masakazu,c/o SHOWA DENKO K.K. , KANEKO, Toraichi
- 申请人: SHOWA DENKO K.K.
- 申请人地址: 13-9, Shiba Daimon,1-chome,Minato-ku Tokyo 105-8518 JP
- 专利权人: SHOWA DENKO K.K.
- 当前专利权人: SHOWA DENKO K.K.
- 当前专利权人地址: 13-9, Shiba Daimon,1-chome,Minato-ku Tokyo 105-8518 JP
- 代理机构: Strehl Schübel-Hopf & Partner
- 优先权: JP2001212890 20010712
- 国际公布: WO2003006374 20030123
- 主分类号: C01B33/107
- IPC分类号: C01B33/107 ; B01D53/22 ; H01L31/20 ; H01L21/205 ; C03B37/00 ; G01N30/14
摘要:
Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a high valent metal fluoride, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a high valent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.
公开/授权文献:
- EP1406837B1 PRODUCTION OF TETRAFLUOROSILANE 公开/授权日:2010-05-05