![METHOD AND APPARATUS FOR MEASURING PHYSICAL PROPERTIES OF MICRO REGION](/ep/2007/04/11/EP1365229A4/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: METHOD AND APPARATUS FOR MEASURING PHYSICAL PROPERTIES OF MICRO REGION
- 专利标题(中):方法和设备测量微小范围的物理特性
- 申请号:EP01908124 申请日:2001-02-28
- 公开(公告)号:EP1365229A4 公开(公告)日:2007-04-11
- 发明人: TANIGUCHI YOSHIFUMI , ICHIHASHI MIKIO , KOUGUCHI MASANARI
- 申请人: HITACHI LTD
- 专利权人: HITACHI LTD
- 当前专利权人: HITACHI LTD
- 优先权: JP0101484 2001-02-28
- 主分类号: G01L1/24
- IPC分类号: G01L1/24 ; G01N23/20 ; G01N23/225 ; H01J37/28 ; H01L21/66
摘要:
A method and apparatus for measuring physical properties of a micro region in which the two-dimensional distribution of stress or strain can be measured in real time with high resolution, high sensitivity and high alignment of measuring position. A sample is scanned with a finely focused electron beam (23, 26), and the positional difference between the diffraction spots (32, 33) is measured by means of a two-dimensional position sensitive electronic sensor (13). The positional difference is outputted as a voltage value and converted into a magnitude of stress or strain according to the principle of nanodiffraction method ,and the distribution of the stress or strain is displayed as an image in synchronism with a position signal on the sample.
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01L | 测量力、应力、转矩、功、机械功率、机械效率或流体压力 |
------G01L1/00 | 力或应力的一般计量 |
--------G01L1/24 | .通过测量材料受应力时其光学性质的变化,例如,应用光弹性应力分析 |