![F2 laser with visible red and IR control](/ep/2001/05/16/EP1100167A2/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: F2 laser with visible red and IR control
- 专利标题(中):F2-Laser mit Kontrolle des sichtbaren roten und IR-Bereichs
- 申请号:EP00111119.4 申请日:2000-05-23
- 公开(公告)号:EP1100167A2 公开(公告)日:2001-05-16
- 发明人: Onkels, Eckehard D. , Sandstrom, Richard L. , Duffey, Thomas P.
- 申请人: Cymer, Inc.
- 申请人地址: 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: 16750 Via del Campo Court San Diego, CA 92127-1712 US
- 代理机构: Grünecker, Kinkeldey, Stockmair & Schwanhäusser Anwaltssozietät
- 优先权: US438249 19991112
- 主分类号: H01S3/225
- IPC分类号: H01S3/225 ; H01S3/097 ; H01S3/03
摘要:
A reliable, modular, production quality F 2 excimer laser capable of producing, at repetition rates in the range of 1,000 to 2,000 Hz or greater, laser pulses with pulse energies greater than 10 mJ with a full width half, maximum bandwidth of about 1 pm or less at wavelength in the range of 157 nm. Laser gas concentrations are disclosed for reducing unwasted infrared emissions from the laser. Also disclosed are UV energy detectors which are substantially insensitive to infrared light. Preferred embodiments of the present invention can be operated in the range of 1000 to 4000 Hz with pulse energies in the range of 10 to 5 mJ with power outputs in the range of 10 to 40 watts. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.1 µm or less. Replaceable modules include a laser chamber and a modular pulse power system.
In a preferred embodiment the laser was tuned to the F 2 157.6 nm line using a set of two external prisms. In a second preferred embodiment the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a third preferred embodiment a line width of 0.2 pm is provided using injection seeding. Another embodiment utilizes a grating for line selection and increases the tuning range by operating the laser at a pressure in excess of 4 atmospheres.
摘要(中):
In a preferred embodiment the laser was tuned to the F 2 157.6 nm line using a set of two external prisms. In a second preferred embodiment the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a third preferred embodiment a line width of 0.2 pm is provided using injection seeding. Another embodiment utilizes a grating for line selection and increases the tuning range by operating the laser at a pressure in excess of 4 atmospheres.
一种可靠,模块化,生产质量高的F2准分子激光器,其能够以1,000至2000Hz或更大的重复频率产生具有大于10mJ的脉冲能量的激光脉冲,全宽度为一半,最大带宽为约1pm, 在157nm范围内的波长较小。 公开了激光气体浓度以减少来自激光器的未焙烧的红外发射。 还公开了对红外光基本上不敏感的紫外线能量检测器。 本发明的优选实施例可以在1000至4000Hz的范围内操作,脉冲能量在10至5mJ的范围内,功率输出在10至40瓦的范围内。 使用该激光器作为照明源,步进器或扫描仪设备可以产生0.1微米或更小的集成电路分辨率。 可更换的模块包括激光室和模块脉冲电源系统。 在优选实施例中,使用一组两个外部棱镜将激光器调谐到F2 157.6nm线。 在第二优选实施例中,激光器被操作为宽带,并且157.6nm线选择在谐振腔外部。 在第三优选实施例中,使用注射接种提供0.2μm的线宽。 另一个实施例利用光栅进行线选择,并通过在超过4个大气压的压力下操作激光来增加调谐范围。
公开/授权文献:
- EP1100167B1 F2 laser with visible red and IR control 公开/授权日:2004-07-28
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01S | 利用受激发射的器件 |
------H01S3/00 | 激光器,即利用受激发射对红外光、可见光或紫外线进行产生、放大、调制、解调或变频的器件 |
--------H01S3/10 | .控制辐射的强度、频率、相位、极化或方向,例如开关、选通、调制或解调 |
----------H01S3/16 | ..固体材料 |
------------H01S3/223 | ...激光气体是多原子的,即含有1个原子以上的 |
--------------H01S3/225 | ....包括1种激发物或激态复合物 |