![ELECTRONIC COMPONENT AND METHOD OF PRODUCTION THEREOF](/ep/1998/05/06/EP0840369A1/abs.jpg.150x150.jpg)
基本信息:
- 专利标题: ELECTRONIC COMPONENT AND METHOD OF PRODUCTION THEREOF
- 专利标题(中):电子元件及其制造方法
- 申请号:EP96920032.8 申请日:1996-05-31
- 公开(公告)号:EP0840369A1 公开(公告)日:1998-05-06
- 发明人: FURUKAWA, Osamu , CHIYOMA, Hitoshi , YABUKAWA, Kazuhisa , DONUMA, Kenichi
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: 72, Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa-ken 210 JP
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: 72, Horikawa-cho, Saiwai-ku Kawasaki-shi, Kanagawa-ken 210 JP
- 代理机构: Zangs, Rainer E., Dipl.-Ing.
- 优先权: JP164379/95 19950630
- 国际公布: WO9702596 19970123
- 主分类号: H01L21/56
- IPC分类号: H01L21/56 ; H01L21/60 ; H01L23/28 ; H03H9/25 ; H03H9/02 ; H03H9/19 ; H03B5/32
摘要:
An electronic device and a fabricating method for fabricating the electronic device, the electronic device comprising; a surface acoustic wave device 3 having a main surface thereon having a transducer portion 4 and wiring patterns 5 connected electrically to the transducer portion; a printed circuit board 1 having wiring patterns 2 formed at least on one main surface thereof; a plurality of conductive bumps 6 which connect electrically both of the mutually opposed wiring patterns and form a space portion 10 between the surface acoustic wave device 3 and a printed circuit board 1; and resin portion 11 which, by heating/melting and hardening, makes an intimate contact with other main surface of the device and coats the device 3 and seals the device 3 together with the printed circuit board 1, wherein, by employing a highly thixotropic and viscous thermo-setting resin compared with a conventional one, an electronic device having a simple structure can be provided and fabricating process for fabricating the electronic device can be simplified.
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/02 | .半导体器件或其部件的制造或处理 |
----------H01L21/027 | ..未在H01L21/18或H01L21/34组中包含的为进一步的光刻工艺在半导体之上制作掩膜 |
------------H01L21/50 | ...应用H01L21/06至H01L21/326中的任一小组都不包含的方法或设备组装半导体器件的 |
--------------H01L21/56 | ....封装,例如密封层、涂层 |