基本信息:
- 专利标题： Improved photochemical vapor deposition method
- 专利标题（中）：Verfahren zur photochemischen Dampfabscheidung。
- 申请号：EP81109700.5 申请日：1981-11-14
- 公开(公告)号：EP0054189A1 公开(公告)日：1982-06-23
- 发明人： Peters, John W. , Gebhart, Frank L.
- 申请人： Hughes Aircraft Company
- 申请人地址： 7200 Hughes Terrace P.O. Box 45066 Los Angeles, California 90045-0066 US
- 专利权人： Hughes Aircraft Company
- 当前专利权人： HUGHES AIRCRAFT COMPANY
- 当前专利权人地址： HUGHES AIRCRAFT COMPANY
- 代理机构： KUHNEN, WACKER & PARTNER
- 优先权： US216041 19801215
- 主分类号： C23C14/28
- IPC分类号： C23C14/28 ; H01L21/203 ; H01L21/363 ; B01J19/08
摘要：
e specification discloses an apparatus and process for use in the photochemical vapor deposition of a selected radiation-opaque material on a target in a photochemical vapor deposition system having a reaction chamber with at least a portion thereof formed of quartz to provide a quartz window therein, and which prevents undesirable deposits on the quartz window to thereby enhance the efficiency and rate of the photochemical vapor deposition process. The apparatus comprises, among other things, a film of a predetermined material, such as a perfluorinated polyether, deposited on the internal face of the quartz window within the reaction chamber, with the predetermined material being characterized by being transparent to a selected wavelength of radiation and having a relatively low adhesive affinity for the selected material being deposited.
摘要（中）：
本说明书公开了一种用于光化学气相沉积系统中的选定的辐射不透明材料的光化学气相沉积的装置和方法，该光化学气相沉积系统具有反应室，其中至少一部分由石英形成，以在其中提供石英窗口， 并且其防止石英窗上的不期望的沉积，从而提高光化学气相沉积工艺的效率和速率。 该装置尤其包括沉积在反应室内的石英窗的内表面上的预定材料（例如全氟化聚醚）的膜，其中预定材料的特征在于对选定波长的辐射是透明的 并且对所沉积的所选择的材料具有相对低的粘合亲和力。
公开/授权文献:
- EP0054189B1 Improved photochemical vapor deposition method 公开/授权日：1988-04-20