![液处理装置](/CN/2017/2/136/images/201720684031.jpg)
基本信息:
- 专利标题: 液处理装置
- 专利标题(英):Wet -processing apparatus
- 申请号:CN201720684031.2 申请日:2017-06-13
- 公开(公告)号:CN207303048U 公开(公告)日:2018-05-01
- 发明人: 安倍昌洋 , 稻田博一 , 东徹 , 中岛常长 , 木下尚文 , 梶原英树
- 申请人: 东京毅力科创株式会社
- 申请人地址: 日本东京都
- 专利权人: 东京毅力科创株式会社
- 当前专利权人: 东京毅力科创株式会社
- 当前专利权人地址: 日本东京都
- 代理机构: 北京林达刘知识产权代理事务所
- 代理人: 刘新宇
- 优先权: 2016-117221 20160613 JP
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; H01L21/02
The utility model provides a wet -processing apparatus. Carry at the nozzle and put the regional wet -processing apparatus who carries out the transport of nozzle between the position that respectively handles who carries on putting the region with a plurality of base plates and suppress the damage of the piping be connected with the nozzle and the decline of suppression productivity ratio. To install the constitution carries the rear of putting regional row for possessing the setting at the base plate for it carries to put the region and be used for making the arm to circle the moving axis and rotates on the horizontal direction and make to carry the nozzle of putting the nozzle the drive division that the axis of rotation moved on left right direction. The follow nozzle carries puts regional general this standby position is carried from the standby position's that the processing position with carrying the destination among the standby position who sets for with each processing position corresponds with corresponding rear to the nozzle, makes this nozzle in this standby position standby after that, later carries this nozzle handle the position. Standby position lies in the base plate and carries to put the regional outside and to lie in when the rear is upwards observed in the front and handle position and nozzle and year put between the region.
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/67 | .专门适用于在制造或处理过程中处理半导体或电固体器件的装置;专门适合于在半导体或电固体器件或部件的制造或处理过程中处理晶片的装置 |