
基本信息:
- 专利标题: 一种用于湿法刻蚀装置的汇流挡板
- 专利标题(英):Conflux baffle plate used for wet etching device
- 申请号:CN201320761023.5 申请日:2013-11-28
- 公开(公告)号:CN203674240U 公开(公告)日:2014-06-25
- 发明人: 庞瑞卿 , 展士飞 , 叶超 , 桑和伟 , 郭梦龙 , 王海超
- 申请人: 合肥海润光伏科技有限公司
- 申请人地址: 安徽省合肥市新站区综合开发实验区大禹路1288号
- 专利权人: 合肥海润光伏科技有限公司
- 当前专利权人: 合肥海润光伏科技有限公司
- 当前专利权人地址: 安徽省合肥市新站区综合开发实验区大禹路1288号
- 代理机构: 南京苏高专利商标事务所
- 代理人: 刘燕娇
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H01L21/67
The utility model discloses a conflux baffle plate used for a wet etching device. The conflux baffle plate used for the wet etching device is characterized in that: the bottom of the conflux baffle plate is an opening triangle- shaped structure. The number of the triangle-shaped structure is consistent with the channel number of the wet method machine of the wet etching device matched to the conflux baffle plate. Conflux grooves are arranged on the internal and external sides of the conflux baffle plate. Outlets of the conflux grooves are distributed on the two ends of the conflux baffle plate. The conflux baffle plate is provided with a triangle-shaped inclined plane and the conflux grooves, so that the liquid drop diversion is benefited and the risk that condensation acidic liquid of a wet etching groove drops onto the surface of a silicon chip is solved. The baffle plate gained by adopting the method of the utility model may be used on the conventional device without the need of changing the structure. The usage and the maintenance are convenient.