![一种蒸镀用掩模板及掩膜组件](/CN/2013/2/123/images/201320617777.jpg)
基本信息:
- 专利标题: 一种蒸镀用掩模板及掩膜组件
- 专利标题(英):Mask plate and mask component for evaporation plating
- 申请号:CN201320617777.3 申请日:2013-10-09
- 公开(公告)号:CN203569176U 公开(公告)日:2014-04-30
- 发明人: 魏志凌 , 高小平 , 潘世珎 , 魏志浩 , 汪行
- 申请人: 昆山允升吉光电科技有限公司
- 申请人地址: 江苏省苏州市昆山市巴城镇红杨路888号
- 专利权人: 昆山允升吉光电科技有限公司
- 当前专利权人: 昆山允升吉光电科技有限公司
- 当前专利权人地址: 江苏省苏州市昆山市巴城镇红杨路888号
- 主分类号: C23C14/04
- IPC分类号: C23C14/04 ; C23C14/24
The utility model discloses a mask plate for evaporation plating. The mask plate comprises a mask plate body and an evaporation plating hole formed in the mask plate body, wherein the evaporation plating hole penetrates through the mask plate body, the edge line of the evaporation plating hole on the cross section where the central axis of the evaporation plating hole is positioned is external-expansion horn-shaped, and the hole wall of the evaporation plating hole and the plate surface of the mask plate body form an included angle of 30-60 degrees. With the mask plate for evaporation plating, provided by the utility model, the blocking of the hole wall of the evaporation plating hole to evaporation plating materials is reduced in the evaporation plating process, evaporation plating process has no evaporation plating dead angle, the thickness of evaporation plating layers is uniform, and the evaporation plating quality is improved.