![等离子体辅助气体产生](/CN/2003/8/2/images/03810274.jpg)
基本信息:
- 专利标题: 等离子体辅助气体产生
- 专利标题(英):Plasma-assisted gas generation
- 申请号:CN03810274.9 申请日:2003-05-07
- 公开(公告)号:CN1653574A 公开(公告)日:2005-08-10
- 发明人: S·库马尔 , D·库马尔
- 申请人: 达纳公司
- 申请人地址: 美国俄亥俄州
- 专利权人: 达纳公司
- 当前专利权人: 达纳公司
- 当前专利权人地址: 美国俄亥俄州
- 代理机构: 北京市中咨律师事务所
- 代理人: 杨晓光; 李峥
- 优先权: 60/378,693 2002.05.08 US; 60/430,677 2002.12.04 US; 60/435,278 2002.12.23 US
- 国际申请: PCT/US2003/014134 2003.05.07
- 国际公布: WO2003/096369 EN 2003.11.20
- 进入国家日期: 2004-11-08
- 主分类号: H01J7/24
- IPC分类号: H01J7/24 ; H01J19/08
Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.
公开/授权文献:
- CN100336156C 等离子体辅助气体产生 公开/授权日:2007-09-05
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01J | 放电管或放电灯 |
------H01J7/00 | 不包含在H01J1/00至H01J5/00各组中并通用于两种或两种以上基本类型的放电管或灯的零部件 |
--------H01J7/24 | .冷却装置(用于主电极的入H01J1/02);加热装置;在放电空间使气体或蒸气循环的方法 |