![半导体装置](/CN/2019/1/4/images/201910022134.jpg)
基本信息:
- 专利标题: 半导体装置
- 专利标题(英):Semiconductor device
- 申请号:CN201910022134.6 申请日:2019-01-10
- 公开(公告)号:CN110838522A 公开(公告)日:2020-02-25
- 发明人: 下条亮平
- 申请人: 株式会社东芝 , 东芝电子元件及存储装置株式会社
- 申请人地址: 日本东京都
- 专利权人: 株式会社东芝,东芝电子元件及存储装置株式会社
- 当前专利权人: 株式会社东芝,东芝电子元件及存储装置株式会社
- 当前专利权人地址: 日本东京都
- 代理机构: 永新专利商标代理有限公司
- 代理人: 戚宏梅
- 优先权: 2018-152946 2018.08.15 JP
- 主分类号: H01L29/739
- IPC分类号: H01L29/739 ; H01L29/06 ; H01L29/08
A semiconductor device includes a first semiconductor layer, a second semiconductor layer selectively provided on the first semiconductor layer, a third semiconductor layer selectively provided on thesecond semiconductor layer, and a control electrode facing a portion of the second semiconductor layer via a first insulating film. The device further includes a fourth semiconductor layer provided on a lower surface side of the first semiconductor layer, a fifth semiconductor layer arranged with the fourth semiconductor layer along a lower surface of the first semiconductor layer, and a sixth semiconductor layer provided between the first and fifth semiconductor layers. The sixth semiconductor layer is connected to the fourth semiconductor layer. The device includes a connecting portion positioned between the first and fifth semiconductor layers. The connecting portion electrically connects the fifth semiconductor layer to the first semiconductor layer, and the sixth semiconductor layeris not provided at the connecting portion.
公开/授权文献:
- CN110838522B 半导体装置 公开/授权日:2023-12-12
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L29/00 | 专门适用于整流、放大、振荡或切换,并具有至少一个电位跃变势垒或表面势垒的半导体器件;具有至少一个电位跃变势垒或表面势垒,例如PN结耗尽层或载流子集结层的电容器或电阻器;半导体本体或其电极的零部件 |
--------H01L29/02 | .按其半导体本体的特征区分的 |
----------H01L29/68 | ..只能通过对一个不通有待整流、放大或切换的电流的电极供给电流或施加电位方可进行控制的 |
------------H01L29/70 | ...双极器件 |
--------------H01L29/72 | ....晶体管型器件,如连续响应于所施加的控制信号的 |
----------------H01L29/739 | .....受场效应控制的 |