基本信息:
- 专利标题： 一种阵列基板及其制备方法
- 专利标题（英）：Array substrate and preparation method thereof
- 申请号：CN201910776269.1 申请日：2019-08-22
- 公开(公告)号：CN110581141A 公开(公告)日：2019-12-17
- 发明人： 卢改平 , 杨祖有
- 申请人： 武汉华星光电技术有限公司
- 申请人地址： 湖北省武汉市东湖开发区高新大道666号生物城C5栋
- 专利权人： 武汉华星光电技术有限公司
- 当前专利权人： 武汉华星光电技术有限公司
- 当前专利权人地址： 湖北省武汉市东湖开发区高新大道666号生物城C5栋
- 代理机构： 深圳翼盛智成知识产权事务所
- 代理人： 黄威
- 主分类号： H01L27/12
- IPC分类号： H01L27/12 ; H01L21/77
The invention provides an array substrate, which comprises a substrate body, multiple film layers arranged on the substrate body and an opening running through at least two film layers, wherein the edges of the film layers run through by the opening are located on the same plane. During formation of the opening, hole pitch of holes formed in each preset film layer is adjusted according to hole offset distance and size deviation of the holes in each preset film layer to make the boundaries of the holes formed in the preset film layers located on the same plane, so that a step-shaped structure is prevented from being formed between different layers of film layers, the part, located in the opening, of an alignment film layer is evenly distributed, and the case that the light transmittance ofthe opening is reduced due to the fact that the alignment film layer is stacked at multiple positions in the opening is effectively prevented.
公开/授权文献:
- CN110581141B 一种阵列基板及其制备方法 公开/授权日：2022-05-03