The invention discloses a polishing solution for chemico-mechanical polishing of lead. The polishing solution for chemico-mechanical polishing of lead comprises: a fine polishing solution comprising abrasive grains, an oxidant, a metal complexing agent, a lubricant and deionized water, wherein the pH value of the fine polishing solution is regulated by adopting a pH regulator; and an anti-oxidation fine polishing solution comprises the abrasive grains, the oxidant, the metal complexing agent, the lubricant and deionized water, wherein the pH of the anti-oxidation fine polishing solution is regulated by adopting the pH regulator. The polishing solution for chemico-mechanical polishing of lead, and a corresponding polishing process thereof can greatly improve the surface flatness and reducethe surface roughness during pure lead polishing, so the surface of the lead is rapidly flat wholly, the polished surface has no defects such as obvious corrosion pits and scratches, and the problemsof plastic flowing, thermal deformation and impurity embedding (such as abrasive particle embedding) of the polished surface layer of a soft material are effectively avoided, thereby the ultra-smoothand damage-free surface of the lead block is obtained, and the good polishing effect of chemico-mechanical polishing of lead is achieved.