The invention discloses a chamber lining, a processing chamber and semiconductor processing equipment. The chamber lining is used for forming a processing space inside the processing chamber, whereinthe processing space is used for limiting the distribution of plasma; the chamber lining comprises a first fence part, a transition connecting part and a second fence part, wherein the transition connecting part extends in a bending manner from the first fence part to the processing space; the second fence part extends in a bending manner from the transition connecting part to a direction oppositeto the first fence part; the first fence part, the transition connecting part and the second fence part together form the processing space; and the transition connecting part is provided with a firstaccommodating structure used for effectively collecting particle impurities generated inside the processing chamber so that the particle impurities can be prevented from falling to the surface of a silicon wafer inside the processing chamber, and therefore the processing yield of the silicon wafer is increased and the manufacturing cost is reduced.