基本信息:
- 专利标题： 一种电感耦合等离子体处理系统
- 专利标题（英）：Inductively coupled plasma processing system
- 申请号：CN201910694285.6 申请日：2019-07-30
- 公开(公告)号：CN110416053A 公开(公告)日：2019-11-05
- 发明人： 刘海洋 , 刘小波 , 李雪冬 , 李娜 , 程实然 , 郭颂 , 胡冬冬 , 许开东
- 申请人： 江苏鲁汶仪器有限公司
- 申请人地址： 江苏省徐州市邳州市经济开发区辽河西路8号
- 专利权人： 江苏鲁汶仪器有限公司
- 当前专利权人： 江苏鲁汶仪器股份有限公司
- 当前专利权人地址： 221300 江苏省徐州市邳州市经济开发区辽河西路8号
- 代理机构： 南京经纬专利商标代理有限公司
- 代理人： 钱超
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
The invention discloses an inductively coupled plasma processing system which switches the connection of radio frequency power between a radio frequency coil and a Faraday shielding device via a switch. When a radio frequency power supply is connected with the radio frequency coil through a matching network, the radio frequency power is coupled into the radio frequency coil for plasma processing.When the radio frequency power supply is connected with the Faraday shielding device through the matching network, the radio frequency power is coupled into the Faraday shielding device to clean the dielectric window and the inner wall of the plasma processing chamber. Meanwhile, the Faraday system and the dielectric window are one component so that installation and maintenance of the radio frequency coil can be facilitated and efficient cleaning of the inner wall of the plasma processing chamber, especially the dielectric window, can be realized.
公开/授权文献:
- CN110416053B 一种电感耦合等离子体处理系统 公开/授权日：2021-03-16