基本信息:
- 专利标题： 一种显示基板的制备方法、显示装置
- 专利标题（英）：Preparation method of display substrate, and display device
- 申请号：CN201910237592.1 申请日：2019-03-27
- 公开(公告)号：CN109920729A 公开(公告)日：2019-06-21
- 发明人： 林亮 , 邹志翔 , 万云海 , 罗标 , 陈彦波
- 申请人： 合肥鑫晟光电科技有限公司 , 京东方科技集团股份有限公司
- 申请人地址： 安徽省合肥市新站区工业园内
- 专利权人： 合肥鑫晟光电科技有限公司,京东方科技集团股份有限公司
- 当前专利权人： 合肥鑫晟光电科技有限公司,京东方科技集团股份有限公司
- 当前专利权人地址： 安徽省合肥市新站区工业园内
- 代理机构： 北京天昊联合知识产权代理有限公司
- 代理人： 柴亮; 张天舒
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/84 ; H01L21/34 ; H01L29/786 ; H01L27/12
The invention provides a preparation method of a display substrate, and a display device, belongs to the technical field of display, and can solve the problem that an existing metal layer is easy to bubble and the product yield is lowered. According to the preparation method of the display substrate disclosed by the invention, after a patterned metal layer is formed by utilizing a photoetching process, the residual photoresist on the surface of the metal is bombarded by plasma, and it needs to be noted that, the residual photoresist is invisible to naked eyes in the prior art; the surface of the photoresist is bombarded by the plasma in the embodiment, so that on one hand, the residual photoresist is impacted by utilizing physical force, and on the other hand, the plasma can chemically react with the residual photoresist group and volatilize in a gas mode, and therefore residual photoresist is thoroughly removed, and bubbling is prevented from being generated by a non-metal structurallayer.
公开/授权文献:
- CN109920729B 一种显示基板的制备方法、显示装置 公开/授权日：2022-12-02
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
| --------H01L21/02 | .半导体器件或其部件的制造或处理 |