基本信息:
- 专利标题： 一种掩膜板及蒸镀装置
- 专利标题（英）：Mask plate and evaporation device
- 申请号：CN201811002302.7 申请日：2018-08-30
- 公开(公告)号：CN109023238A 公开(公告)日：2018-12-18
- 发明人： 吕守华 , 孙朴 , 王琦 , 张新建 , 王震 , 张健
- 申请人： 京东方科技集团股份有限公司 , 鄂尔多斯市源盛光电有限责任公司
- 申请人地址： 北京市朝阳区酒仙桥路10号;
- 专利权人： 京东方科技集团股份有限公司,鄂尔多斯市源盛光电有限责任公司
- 当前专利权人： 京东方科技集团股份有限公司,鄂尔多斯市源盛光电有限责任公司
- 当前专利权人地址： 北京市朝阳区酒仙桥路10号;
- 代理机构： 北京同达信恒知识产权代理有限公司
- 代理人： 郭润湘
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C14/24
The invention relates to the technical field of display equipment, and discloses a mask plate and an evaporation device. The mask plate comprises a frame with an opening and a mask plate body which covers the opening and is stretched and fixed to the first side face of the frame. The inner side face, formed by the frame, of the opening is connected with the first side face through an inclined facewhich is gradually inclined to the opening along the first side face, and the surface, opposite to the opening, of the mask plate body forms a concave area. According to the mask plate, the mask plate body is in smooth fit with the edge, at the opening of the frame, of a glass substrate, fitting of the mask plate body and the glass substrate is smoother, and then fitting of the mask plate body and the glass substrate is closer. During evaporation of sub-pixels, the position precision of the sub-pixels is high, the pixel contour is clear, and poor color mixing is avoided.
公开/授权文献:
- CN109023238B 一种掩膜板及蒸镀装置 公开/授权日：2021-01-22