The invention discloses a preparation method of a tungsten-doped type diamond film. The preparation method comprises the following steps that a substrate is cleaned, so that oil stains and impuritieson the surface of the substrate are removed; and 2, ion beam deposition equipment and linear ion source deposition equipment which communicate with each other are adopted, a tungsten target is adoptedas a doping source of the ion beam deposition equipment, methane is adopted as a carbon source of the linear ion source deposition equipment, the substrate is put in a vacuum chamber of the ion beamdeposition equipment, the ion beam deposition equipment is started, so that the tungsten target is hit by argon ions, meanwhile, the linear ion source deposition equipment is started for injection ofthe carbon source, and tungsten reacts with carbon, so that the tungsten-doped type diamond film is obtained. In the whole process, the ion beam deposition equipment and the linear ion source deposition equipment work independently and do not interface with each other, and technological parameters are set separately; the carbon simply reacts with the tungsten in the whole process, and no other ionexists; and the process is simple, and controllability is great.