![冗余通孔互连结构](/CN/2015/8/16/images/201580084769.jpg)
基本信息:
- 专利标题: 冗余通孔互连结构
- 专利标题(英):REDUNDANT THROUGH-HOLE INTERCONNECT STRUCTURES
- 申请号:CN201580084769.9 申请日:2015-12-23
- 公开(公告)号:CN108701669A 公开(公告)日:2018-10-23
- 发明人: A·E·舒克曼 , S·R·S·博雅帕提 , M·D·穆萨利姆
- 申请人: 英特尔公司
- 申请人地址: 美国加利福尼亚
- 专利权人: 英特尔公司
- 当前专利权人: 英特尔公司
- 当前专利权人地址: 美国加利福尼亚
- 代理机构: 永新专利商标代理有限公司
- 代理人: 林金朝; 王英
- 国际申请: PCT/US2015/000491 2015.12.23
- 国际公布: WO2017/111867 EN 2017.06.29
- 进入国家日期: 2018-05-23
- 主分类号: H01L23/48
- IPC分类号: H01L23/48 ; H01L21/60
Techniques and mechanisms for efficiently providing reliable connection through a substrate such as that of a core of a packaged integrated circuit device. In an embodiment, a substrate has formed therein a through-hole interconnects, wherein an insulator is disposed between the through-hole interconnects in the substrate. A redundant configuration of the through-hole interconnects with respect toeach other allows for a higher tolerance of voids being formed in the through-hole interconnects. In another embodiment, the through-hole interconnects are shorted together at one side of the substrate, and are further shorted together at an opposite side of the substrate. A total volume of any voids formed by one of the through-hole interconnects is equal to or more than six thousand cubic micrometers.
公开/授权文献:
- CN108701669B 冗余通孔互连结构 公开/授权日:2023-01-17
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L23/00 | 半导体或其他固态器件的零部件 |
--------H01L23/48 | .用于向或自处于工作中的固态物体通电的装置,例如引线、接线端装置 |