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基本信息:
- 专利标题: 一种贴片式铝电解电容器低压电极箔的腐蚀方法
- 专利标题(英):Corrosion method for low-voltage electrode foil of V-CHIP aluminum electrolytic capacitor
- 申请号:CN201810226416.3 申请日:2018-03-19
- 公开(公告)号:CN108486645A 公开(公告)日:2018-09-04
- 发明人: 严季新 , 陈健 , 王建中 , 周小兵 , 于永 , 王亚飞 , 张智源 , 赵宇飞 , 吴骏 , 钱琳灵
- 申请人: 南通海星电子股份有限公司 , 南通海一电子有限公司 , 四川中雅科技有限公司
- 申请人地址: 江苏省南通市通州区平潮镇通扬南路518号
- 专利权人: 南通海星电子股份有限公司,南通海一电子有限公司,四川中雅科技有限公司
- 当前专利权人: 南通海星电子股份有限公司,南通海一电子有限公司,四川中雅科技有限公司
- 当前专利权人地址: 江苏省南通市通州区平潮镇通扬南路518号
- 代理机构: 南京正联知识产权代理有限公司
- 代理人: 吴惠松
- 主分类号: C25F3/04
- IPC分类号: C25F3/04 ; C23F1/20 ; C23F11/173 ; H01G9/055 ; H01G9/045
The invention discloses a corrosion method for low-voltage electrode foil of a V-CHIP aluminum electrolytic capacitor. The corrosion method comprises the following steps that a mixed solution of hydrochloric acid, sulfuric acid and AlCl3 is adopted for soaking, and pretreatment is achieved; the hydrochloric acid, sulfuric acid and AlCl3 solution is electrified for hole generating corrosion; intermediate treatment is conducted on the hydrochloric acid, sulfuric acid and AlCl3 solution, and washing is conducted with pure water; the steps of hole generating corrosion, intermediate treatment and washing are repeated; reaming electrifying corrosion is conducted in corrosive liquid of hydrochloric acid, sulfuric acid, AlCl3, phosphoric acid and polystyrolsulfon acid or sodium polystyrenesulfonate, soaking is conducted with the hydrochloric acid, sulfuric acid, AlCl3 and phosphoric acid solution, washing is conducted with pure water, and the steps of reaming corrosion, soaking and washing arerepeated; and lastly, soaking is conducted by adopting a nitric acid solution, and annealing treatment is conducted after washing is conducted with the pure water. The corrosive aluminum foil produced through the corrosion method has the characteristics of being small in corrosion depth, good in mechanical property and low in contact resistance after being formed and is effectively suitable for being used for the capacitor with the minimum width of 2.2 mm in the manufacturing process of the V-CHIP capacitor.
公开/授权文献:
- CN108486645B 一种贴片式铝电解电容器低压电极箔的腐蚀方法 公开/授权日:2020-09-22