
基本信息:
- 专利标题: 正型感光性树脂组合物
- 专利标题(英):Positive photosensitive resin composition
- 申请号:CN201780007344.7 申请日:2017-01-19
- 公开(公告)号:CN108475016A 公开(公告)日:2018-08-31
- 发明人: 大村浩之 , 畑中真 , 竹田佳代 , 汤川升志郎
- 申请人: 日产化学工业株式会社
- 申请人地址: 日本东京都
- 专利权人: 日产化学工业株式会社
- 当前专利权人: 日产化学工业株式会社
- 当前专利权人地址: 日本东京都
- 代理机构: 北京市中咨律师事务所
- 代理人: 段承恩; 李照明
- 优先权: 2016-009111 2016.01.20 JP
- 国际申请: PCT/JP2017/001760 2017.01.19
- 国际公布: WO2017/126610 JA 2017.07.27
- 进入国家日期: 2018-07-19
- 主分类号: G03F7/023
- IPC分类号: G03F7/023 ; G03F7/004
The invention provides a positive photosensitive resin composition which is suitable as a material for partition wall between pixels or a material for forming a patterned insulating film used in liquid crystal display elements, organic EL display elements and the like, and which enables retention of good images after curing, while being capable of maintaining high water repellency and high oil repellency even after oxygen plasma (ozone) processing and the like. A positive photosensitive resin composition which is able to be thermally cured and contains the component (A), the component (B) andthe component (C) described below and a solvent (D). Component (A): a polymer having a liquid repellent group and a quinonediazide group, component (B): an alkali-soluble resin, component (C): a 1, 2-quinonediazide compound, and (D) a solvent.
公开/授权文献:
- CN108475016B 正型感光性树脂组合物 公开/授权日:2021-09-10