
基本信息:
- 专利标题: 一种含咪唑离子的光固化单体及其在自修复材料中的应用
- 专利标题(英):Imidazole-ion-containing photocurable monomer and application of photocurable monomer in self-repairing material
- 申请号:CN201810042767.9 申请日:2018-01-17
- 公开(公告)号:CN108329265A 公开(公告)日:2018-07-27
- 发明人: 孙芳 , 弓浩然
- 申请人: 北京化工大学
- 申请人地址: 北京市朝阳区北三环东路15号
- 专利权人: 北京化工大学
- 当前专利权人: 北京化工大学
- 当前专利权人地址: 北京市朝阳区北三环东路15号
- 主分类号: C07D233/60
- IPC分类号: C07D233/60 ; C08F220/20 ; C08F220/40 ; C08F234/00 ; C08F220/18 ; C08F220/28 ; C08F2/48
The invention provides synthesis of an imidazole-ion-containing photocurable monomer and an application of the photocurable monomer in a self-repairing material. The synthesis of the photocurable monomer comprises the following steps: bifunctional acrylate, imidazole and organic base are added to a reactor, and an intermediate product 1 is obtained; the product 1 is subjected to reaction with haloalkane, and the imidazole-ion-containing photocurable monomer is obtained. The self-repairing photocurable material is obtained from the imidazole-ion-containing photocurable monomer, other monomers and a photoinitiator under the action of ultraviolet light. The synthesis has the following beneficial effects: (1) the synthesized imidazole-ion-containing photocurable monomer can be quickly cured under the action of ultraviolet light; (2) the synthesized imidazole-ion-containing photocurable monomer has good compatibility with other monomers, and performance of the material can be adjusted by changing the ratio of the monomer to other monomers; (3) the photocurable material can be endowed with self-repairing performance by the synthesized imidazole-ion-containing photocurable monomer, safetyof the photocurable material is effectively improved, the service life of the material is prolonged, and environmental pollution is reduced.
公开/授权文献:
- CN108329265B 一种含咪唑离子的光固化单体及其在自修复光固化材料中的应用 公开/授权日:2020-11-03
IPC结构图谱:
C | 化学;冶金 |
--C07 | 有机化学 |
----C07D | 杂环化合物 |
------C07D233/00 | 杂环化合物,含1,3-二唑或氢化1,3-二唑环、不与其他环稠合 |
--------C07D233/04 | .环原子间或环原子与非环原子间有1个双键 |
----------C07D233/56 | ..只有氢原子或仅含氢原子和碳原子的基,连在环碳原子上 |
------------C07D233/60 | ...有被氧或硫原子取代的烃基,连在环氮原子上 |