![用于扫描电子显微镜中的X射线靶组件](/CN/2017/1/252/images/201711260936.jpg)
基本信息:
- 专利标题: 用于扫描电子显微镜中的X射线靶组件
- 专利标题(英):X ray target assembly for scanning electron microscope (SEM)
- 申请号:CN201711260936.8 申请日:2017-12-04
- 公开(公告)号:CN108155079A 公开(公告)日:2018-06-12
- 发明人: 王琦 , 王宗伟 , 唐兴 , 孟婕 , 马小军 , 顾倩倩 , 高党忠 , 姜凯 , 马文朝
- 申请人: 中国工程物理研究院激光聚变研究中心
- 申请人地址: 四川省绵阳市绵山路64号
- 专利权人: 中国工程物理研究院激光聚变研究中心
- 当前专利权人: 中国工程物理研究院激光聚变研究中心
- 当前专利权人地址: 四川省绵阳市绵山路64号
- 代理机构: 成都虹桥专利事务所
- 代理人: 杨长青
- 主分类号: H01J37/28
- IPC分类号: H01J37/28 ; H01J37/16 ; G01N23/2252
The invention discloses an X ray target assembly for an SEM, and relates to the technical field of SEMs. Secondary electrons generated after bombardment of an SEM electron beam on a target material can be shielded effectively, and the problem that the secondary electrons and stray light induced by the secondary electrons cause adverse influence on the imaging quality of X rays is solved. The X raytarget assembly for the SEM comprises a target material and a shielding case, the target material is disposed in the shielding case, the shielding case is provided with at least one incident port andat least one exit port, one or multiple target material(s) is/are disposed in the shielding case, and each target material is provided with the corresponding incident port and exit port in the shielding case. The electron beam of the SEM is input via the incident ports, X rays generated after bombardment of the target materials are output via the exit ports, secondary electrons generated by bombardment are shielded effectively by the shielding case, and influence of secondary electrons and stray light induced by the secondary electrons on the imaging quality of X rays is avoided.
公开/授权文献:
- CN108155079B 用于扫描电子显微镜中的X射线靶组件 公开/授权日:2019-07-05