基本信息:
- 专利标题： 掩膜板及其制造方法、掩膜组件及蒸镀装置
- 专利标题（英）：Mask plate, manufacturing method thereof, mask assembly and evaporation device
- 申请号：CN201810002259.8 申请日：2018-01-02
- 公开(公告)号：CN107904554A 公开(公告)日：2018-04-13
- 发明人： 张新建 , 刘丽国 , 尹志
- 申请人： 京东方科技集团股份有限公司 , 鄂尔多斯市源盛光电有限责任公司
- 申请人地址： 北京市朝阳区酒仙桥路10号
- 专利权人： 京东方科技集团股份有限公司,鄂尔多斯市源盛光电有限责任公司
- 当前专利权人： 京东方科技集团股份有限公司,鄂尔多斯市源盛光电有限责任公司
- 当前专利权人地址： 北京市朝阳区酒仙桥路10号
- 代理机构： 北京三高永信知识产权代理有限责任公司
- 代理人： 滕一斌
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C14/24
The invention provides a mask plate, a manufacturing method thereof, a mask assembly and an evaporation device and belongs to the technical field of display. The mask plate comprises a mask figure zone and a perimeter zone of the mask figure zone. The perimeter zone comprises sunken structures, and the sunken direction of the sunken structures is parallel with the thickness direction of the mask plate. By means of the mask plate, the manufacturing method thereof, the mask assembly and the evaporation device, the problem that when a glass substrate is superposed at the side, far away from a mask frame, of the mask plate in the mask assembly, the glass substrate can be scratched easily by welding spots protruding out of the surface of the mask plate is solved; and the manufacturing method isused for manufacturing the mask plate.