
基本信息:
- 专利标题: 一种基于特定形貌、尺寸分级结构金属氧化物的MEMS气体传感芯片及其制造方法
- 专利标题(英):Metal oxide MEMS gas sensing chip based on specific morphology and size grading structure and manufacture method thereof
- 申请号:CN201710774113.0 申请日:2017-08-31
- 公开(公告)号:CN107632115A 公开(公告)日:2018-01-26
- 发明人: 刘善堂 , 肖丽 , 余庚 , 舒绍明 , 黄峰 , 刘欢欢
- 申请人: 武汉工程大学
- 申请人地址: 湖北省武汉市洪山区雄楚大街693号
- 专利权人: 武汉工程大学
- 当前专利权人: 武汉工程大学
- 当前专利权人地址: 湖北省武汉市洪山区雄楚大街693号
- 代理机构: 湖北武汉永嘉专利代理有限公司
- 代理人: 崔友明
- 主分类号: G01N33/00
- IPC分类号: G01N33/00
The invention discloses a metal oxide MEMS gas sensing chip based on a secific morphology and a size grading structure and a manufacture method thereof. The method comprises the following steps: 1) preparing a metal oxide sensitive material having the specific morphology and size; 2) mixing the prepared sensitive material obtained in the step 1) and nano-level metal oxide, adding precious metal toobtain the doped grading-structure sensitive material; 3) mixing the prepared grading sensitive material and a solvent, a wetting agent, a dispersant, a surfactant, and a pH conditioning agent, stirring a mixture and defoaming the mixture to obtain an uniformly dispersed multi-component slurry; and 4) spraying the prepared slurry on a MEMS micro-heating plate, and performing low-temperature and high-temperature treatment to form an uniform and sensitive membrane layer to manufacture the MEMS gas sensing chip. The grading-structure sensitive material has the advantages of high sensitivity andbatch synthesis; the formed sensitive membrane layer is stable and uniform, and has the advantages of good consistency and less material amount; the MEMS gas sensing chip has high response on VOCs, and is expected to be widely used in intelligent household, medical application, cell phone and bracelet.
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01N | 借助于测定材料的化学或物理性质来测试或分析材料 |
------G01N33/00 | 利用不包括在G01N1/00至G01N31/00组中的特殊方法来研究或分析材料 |