基本信息:
- 专利标题： 制造EUV模块的方法、EUV模块和EUV光刻系统
- 专利标题（英）：METHOD FOR PRODUCING AN EUV MODULE, EUV MODULE AND EUV LITHOGRAPHY SYSTEM
- 申请号：CN201680021433.2 申请日：2016-04-19
- 公开(公告)号：CN107531581A 公开(公告)日：2018-01-02
- 发明人： A.施梅尔
- 申请人： 卡尔蔡司SMT有限责任公司
- 申请人地址： 德国上科亨
- 专利权人： 卡尔蔡司SMT有限责任公司
- 当前专利权人： 卡尔蔡司SMT有限责任公司
- 当前专利权人地址： 德国上科亨
- 代理机构： 北京市柳沈律师事务所
- 代理人： 王蕊瑞
- 优先权： 102015208831.6 20150512 DE
- 国际申请： PCT/EP2016/058672 2016.04.19
- 国际公布： WO2016/180609 EN 2016.11.17
- 进入国家日期： 2017-10-12
- 主分类号： C04B37/00
- IPC分类号： C04B37/00 ; G03F7/20
The invention relates to a method for coating a surface (101) of an EUV submodule (120, 130) of ceramic material (100) that is intended for use in an EUV lithography system (500). Firstly, metallic solder (114) is applied to the surface (101) of the ceramic substrate (100) over its full surface area. Then a thermal treatment is performed for producing a material bond (116) between the ceramic material (100) and the metallic solder (114). The invention also relates to a method for producing an EUV module (200). For this purpose, at least two EUV submodules (120, 130) respectively coated over their full surface area by the method described above are joined by soldering or adhesive bonding. The invention relates furthermore to an EUV submodule (120, 130), to an EUV module (200) and to an EUVlithography system.
公开/授权文献:
- CN107531581B 制造EUV模块的方法、EUV模块和EUV光刻系统 公开/授权日：2021-07-06