
基本信息:
- 专利标题: 掩膜版、过孔及显示基板的形成方法、显示基板及装置
- 专利标题(英):Mask, hole forming method, display substrate forming method, display substrate and display device
- 申请号:CN201710447407.2 申请日:2017-06-14
- 公开(公告)号:CN107247386A 公开(公告)日:2017-10-13
- 发明人: 王小元 , 杨妮 , 方琰 , 齐智坚 , 李云泽 , 许亨艺
- 申请人: 京东方科技集团股份有限公司 , 重庆京东方光电科技有限公司
- 申请人地址: 北京市朝阳区酒仙桥路10号;
- 专利权人: 京东方科技集团股份有限公司,重庆京东方光电科技有限公司
- 当前专利权人: 京东方科技集团股份有限公司,重庆京东方光电科技有限公司
- 当前专利权人地址: 北京市朝阳区酒仙桥路10号;
- 代理机构: 北京银龙知识产权代理有限公司
- 代理人: 许静; 刘伟
- 主分类号: G03F1/54
- IPC分类号: G03F1/54 ; G02F1/1362 ; H01L27/12
The invention provides a mask, a hole forming method, a display substrate forming method, a display substrate and a display device. The mask is used for forming a hole on a film, and comprises a light-transmittable pattern used for forming the hole; and the light-transmittable pattern has a curved edge. Because the light-transmittable pattern on the mask has the curved edge, the bottom of the hole formed by adoption of the mask also has the curved edge; therefore, the length of a contact boundary line of upper and lower conductive layers electrically connected through the hole can be increased; the contact resistance between the upper and lower conductive layers can be reduced; the connectivity between the upper and lower conductive layers can be improved; in addition, in an exposure process for forming the hole, the transmission amount of light at the edge of the light-transmittable pattern is relatively low; only a part of thickness of the film corresponding to the part can be exposed; therefore, the slope angle of the inner wall of the formed hole is relatively small; the segment gap of the hole can be reduced; breakage of the upper conductive layer in the hole can be avoided; and thus, the connectivity is further improved.
IPC结构图谱:
G | 物理 |
--G03 | 摄影术;电影术;利用了光波以外其他波的类似技术;电记录术;全息摄影术 |
----G03F | 图纹面的照相制版工艺,例如,印刷工艺、半导体器件的加工工艺;其所用材料;其所用原版;其所用专用设备 |
------G03F1/00 | 用于图纹面的照相制版的原版的制备 |
--------G03F1/54 | .吸收剂,例如不透明材料 |