
基本信息:
- 专利标题: 涡旋光束产生方法、器件及其制备方法
- 专利标题(英):Method for generating vortex light beam, and vortex light beam device and preparation method thereof
- 申请号:CN201480081159.9 申请日:2014-10-10
- 公开(公告)号:CN106575098A 公开(公告)日:2017-04-19
- 发明人: 王健 , 杜竫 , 贺继方
- 申请人: 华为技术有限公司
- 申请人地址: 广东省深圳市龙岗区坂田华为总部办公楼
- 专利权人: 华为技术有限公司
- 当前专利权人: 华为技术有限公司
- 当前专利权人地址: 广东省深圳市龙岗区坂田华为总部办公楼
- 代理机构: 北京三高永信知识产权代理有限责任公司
- 代理人: 张耀光
- 国际申请: PCT/CN2014/088293 2014.10.10
- 国际公布: WO2016/054803 ZH 2016.04.14
- 进入国家日期: 2017-02-17
- 主分类号: G03H1/12
- IPC分类号: G03H1/12 ; G02B27/10 ; G21K1/00
A vortex light beam device comprising: a metal reflector (101), a low refractive index layer (102), and a plurality of elliptical dielectric units (103). The low refractive index layer (102) covers the metal reflector (101), and the plurality of elliptical dielectric units (103) are embedded in the low refractive index layer (102). The plurality of elliptical dielectric units (103) are distributed in an array format, and the straight lines at the long axis of the plurality of elliptical dielectric units (103) are parallel or coincident. The thickness of the plurality of elliptical dielectric units (103) is the same, and the thickness of the low refractive index layer (102) is greater than the thickness of the elliptical dielectric units (103). The outer surface of each elliptical dielectric unit (103) is flush with the outer surface of the low refractive index layer (102), and the outer surface of the elliptical dielectric units (103) and the outer surface of the low refractive index layer (102) is the surface furthest from the metal reflector (101); the refractive index of the low refractive index layer (102) is lower than the refractive index of the elliptical dielectric units (103). Also disclosed are a preparation method for the vortex light beam device and a method for generating a vortex light beam.
公开/授权文献:
- CN106575098B 涡旋光束产生方法、器件及其制备方法 公开/授权日:2019-05-24
IPC结构图谱:
G | 物理 |
--G03 | 摄影术;电影术;利用了光波以外其他波的类似技术;电记录术;全息摄影术 |
----G03H | 全息摄影的工艺过程或设备 |
------G03H1/00 | 应用光波、红外波或紫外波取得全息图或由此获得图像的全息摄影工艺过程或设备;及其特殊的零部件 |
--------G03H1/04 | .产生全息图的工艺过程或设备 |
----------G03H1/10 | ..应用调制的参考光束的 |
------------G03H1/12 | ...空间调制,例如,幻影成像 |