
基本信息:
- 专利标题: 用于大型结构物变形或位移参数的自校准式测量装置及方法
- 专利标题(英):Self-calibration type measuring device and method for large-scale structure deformation or displacement parameters
- 申请号:CN201610628659.0 申请日:2016-08-03
- 公开(公告)号:CN106197287A 公开(公告)日:2016-12-07
- 发明人: 高文武 , 屈战辉
- 申请人: 西安敏文测控科技有限公司
- 申请人地址: 陕西省西安市航天基地神舟四路航创国际广场A区六楼607室
- 专利权人: 西安敏文测控科技有限公司
- 当前专利权人: 西安敏文测控科技有限公司
- 当前专利权人地址: 陕西省西安市航天基地神舟四路航创国际广场A区六楼607室
- 代理机构: 西安文盛专利代理有限公司
- 代理人: 李中群
- 主分类号: G01B11/02
- IPC分类号: G01B11/02 ; G01B11/16
The invention discloses a self-calibration type measuring device and method for large-scale structure deformation or displacement parameters. The device comprises an imaging system and at least one measuring target installed on a large-scale structure measuring point and further comprises a reference target installed in a deformation or displacement change negligible region on a large-scale structure. The reference target and the measuring targets are imaged at different positions of a sensitive element of the imaging system, and the displacement or deformation parameters of the measuring point are calculated according to the results of the measuring targets and the result of the reference target. Measuring errors, caused by environment temperature or timeliness or installation foundation deformation of an imaging system, of a measuring system are overcome, and measuring precision is improved.
公开/授权文献:
- CN106197287B 用于大型结构物变形或位移参数的自校准式测量装置及方法 公开/授权日:2018-10-02
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01B | 长度、厚度或类似线性尺寸的计量;角度的计量;面积的计量;不规则的表面或轮廓的计量 |
------G01B11/00 | 以采用光学方法为特征的计量设备 |
--------G01B11/02 | .用于计量长度、宽度或厚度 |