基本信息:
- 专利标题： 曝光装置及曝光方法
- 申请号：CN201610096405.9 申请日：2016-02-22
- 公开(公告)号：CN106098519B 公开(公告)日：2017-12-01
- 发明人： 山田章夫 , 濑山雅裕 , 那须野秀树
- 申请人： 爱德万测试株式会社
- 申请人地址： 日本东京市
- 专利权人： 爱德万测试株式会社
- 当前专利权人： 爱德万测试株式会社
- 当前专利权人地址： 日本东京市
- 代理机构： 深圳新创友知识产权代理有限公司
- 代理人： 江耀纯
- 优先权： 2015-090454 2015.04.27 JP
- 主分类号： H01J37/244
- IPC分类号： H01J37/244 ; H01J37/317
Objective: To use a charged particle beam to form a complex and fine pattern by decreasing movement error of a stage. Means for Achieving the Objective: an exposure apparatus comprising a beam generating section that generates a charged particle beam; a stage section (110) that has a sample (10) mounted thereon and moves the sample relative to the beam generating section; a detecting section (114) that detects a position of the stage section; a predicting section (1000) that generates a predicted drive amount obtained by predicting a drive amount of the stage section based on a detected position of the stage section; and an irradiation control section (170) that performs irradiation control for irradiating the sample with the charged particle beam, based on the predicted drive amount. Also provided is an exposure method.
公开/授权文献:
- CN106098519A 曝光装置及曝光方法 公开/授权日：2016-11-09
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01J | 放电管或放电灯 |
| ------H01J37/00 | 有把物质或材料引入使受到放电作用的结构的电子管,如为了对其检验或加工的 |
| --------H01J37/02 | .零部件 |
| ----------H01J37/244 | ..检测器；所采用的组件或电路 |