The invention discloses a silicon nanometer brick array structure applied to a Fourier three-dimensional holography and a design method therefor. The silicon nanometer brick array structure is an array formed by silicon nanometer brick units in arrangement; each silicon nanometer brick units comprise dielectric substrates and silicon nanometer bricks etched in the dielectric substrates; in the array, the lengths, widths and heights of all the dielectric substrates are equal; and the lengths, widths and heights of the silicon nanometer bricks are designed according to phase requirements. The silicon nanometer brick array structure enables linearly polarized lights parallel to the long edge direction of the nanometer bricks and the linearly polarized lights parallel to the wide-edge direction of the nanometer bricks to be subjected to holographic sheet diffraction to represent different holographic images; and a three-dimensional holographic effect with a high signal to noise ratio, a large viewing angle and good experiment can be observed based on a parallax effect through polarized glasses; and the silicon nanometer brick array structure is simple in process, and can be widely applied to the fields of display, sensing, anti-counterfeiting, information memory and the like.