![氧化锌靶材的制备方法及氧化锌薄膜的制备方法](/CN/2015/1/192/images/201510964540.jpg)
基本信息:
- 专利标题: 氧化锌靶材的制备方法及氧化锌薄膜的制备方法
- 申请号:CN201510964540.6 申请日:2015-12-18
- 公开(公告)号:CN105565798B 公开(公告)日:2018-09-04
- 发明人: 许积文 , 唐浩 , 宋永生 , 李文杰 , 莫方策 , 韦崇敏
- 申请人: 广东风华高新科技股份有限公司
- 申请人地址: 广东省肇庆市风华路18号风华电子工业城
- 专利权人: 广东风华高新科技股份有限公司
- 当前专利权人: 广东风华高新科技股份有限公司
- 当前专利权人地址: 广东省肇庆市风华路18号风华电子工业城
- 代理机构: 广州华进联合专利商标代理有限公司
- 代理人: 生启
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/38 ; C04B35/453 ; C04B35/64
The invention discloses a preparation method of a zinc oxide target and a preparation method of a zinc oxide film. The preparation method of the zinc oxide target comprises the following steps: providing a target raw material, and ball milling the target raw material for the first time to obtain powder; calcining the powder; ball milling the calcined powder for the second time and then granulating to obtain particles; forming the particles into a biscuit; degreasing the biscuit in air atmosphere to obtain a degreased biscuit; and anaerobically sintering the degreased biscuit to obtain the zinc oxide target. The zinc oxide target prepared by the preparation method of the zinc oxide target has good electrical conductivity. The conductive target may be made into a zinc oxide film high in resistivity and transparency by means of direct-current magnetron sputtering and oxygen atmospheric coating. The target prepared in the invention can meet the requirements for direct-current magnetron sputtering and high-resistance zinc oxide film preparation.
公开/授权文献:
- CN105565798A 氧化锌靶材的制备方法及氧化锌薄膜的制备方法 公开/授权日:2016-05-11