基本信息:
- 专利标题： 辐射源和光刻设备
- 申请号：CN201480046880.4 申请日：2014-07-24
- 公开(公告)号：CN105474101B 公开(公告)日：2017-11-28
- 发明人： O·诺德曼 , M·奥林斯
- 申请人： ASML荷兰有限公司
- 申请人地址： 荷兰维德霍温
- 专利权人： ASML荷兰有限公司
- 当前专利权人： ASML荷兰有限公司
- 当前专利权人地址： 荷兰维德霍温
- 代理机构： 中科专利商标代理有限责任公司
- 代理人： 张启程
- 优先权： 61/870,128 2013.08.26 US
- 国际申请： PCT/EP2014/065905 2014.07.24
- 国际公布： WO2015/028211 EN 2015.03.05
- 进入国家日期： 2016-02-24
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01S3/23 ; H05G2/00 ; G02B27/09 ; G02B26/06
A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.
公开/授权文献:
- CN105474101A 辐射源和光刻设备 公开/授权日：2016-04-06