基本信息:
- 专利标题： 导电膜形成用组合物和导电膜的制造方法
- 申请号：CN201480037398.4 申请日：2014-06-12
- 公开(公告)号：CN105358640B 公开(公告)日：2018-06-29
- 发明人： 津山博昭 , 渡边徹 , 早田佑一
- 申请人： 富士胶片株式会社
- 申请人地址： 日本东京都
- 专利权人： 富士胶片株式会社
- 当前专利权人： 富士胶片株式会社
- 当前专利权人地址： 日本东京都
- 代理机构： 北京三友知识产权代理有限公司
- 代理人： 庞东成; 张志楠
- 优先权： 2013-156621 2013.07.29 JP
- 国际申请： PCT/JP2014/065569 2014.06.12
- 国际公布： WO2015/015918 JA 2015.02.05
- 进入国家日期： 2015-12-29
- 主分类号： C09D201/00
- IPC分类号： C09D201/00 ; C09D1/00 ; C09D5/24 ; C09D7/63 ; H01B1/00 ; H01B1/22 ; H01B13/00 ; H05K1/09 ; H05K3/12
The present invention provides an electroconductive-film-forming composition capable of forming an electroconductive film having excellent conductivity and few voids and a method for producing an electroconductive film using the same. The electroconductive-film-forming composition of the present invention contains copper particles having an average particle diameter of 1 nm to 10 µm, copper oxide particles having an average particle diameter of 1 nm to 500 nm, a reducing agent having a hydroxy group, a metal catalyst including metals other than copper, and a solvent, in which the content of the copper oxide particles is 50% by mass to 300% by mass with respect to the content of the copper particles, the content of the reducing agent is 100 mol% to 800 mol% with respect to the content of the copper oxide particles, and the content of the metal catalyst is 10% by mass or less with respect to the content of the copper oxide particles.
公开/授权文献:
- CN105358640A 导电膜形成用组合物和导电膜的制造方法 公开/授权日：2016-02-24