The invention discloses a preparation method of a selectively textured crystal silicon solar cell. The method comprises the following steps: (1) cleaning a silicon wafer; (2) forming a silicon dioxide layer on the front surface of the silicon wafer; (3) printing corrosive slurry on the silicon dioxide layer; (4) removing the silicon dioxide layer in a printing region of the corrosive slurry; (5) carrying out acid texturing on the silicon wafer, forming the surface of the region corresponding to a positive electrode grid line into a smooth surface, and forming the other regions into a textured structure; (6) carrying out high-sheet resistance phosphorus diffusion on the front surface of the silicon wafer, so that the surface of the region corresponding to the positive electrode grid line has uniform high-sheet resistance phosphorus doping concentration; (7) removing front phosphorosilicate glass and peripheral PN junctions, which are formed by phosphorus diffusion; (8) forming an anti-reflection film on the front surface of the silicon wafer; (9) printing a back electrode and an aluminium-back surface field on the back surface of the silicon wafer; (10) printing positive electrode slurry on the front surface of the silicon wafer to form a positive electrode; and (11) sintering the silicon wafer to form the solar cell. The preparation method of the selectively textured crystal silicon solar cell has the beneficial effect that the photoelectric conversion efficiency of the cell is effectively improved.